METHOD OF MANUFACTURING NANOWIRES AND AN ELECTRONIC DEVICE

摘要

A method of manufacturing nanowires (104) is provided, according to which method the nanowires are prepared by etching a semiconductor substrate (10) in a direction substantially perpendicular to the surface of the semiconductor substrate (10). The etching is preceded by the provision of a pattern of isolated domains at the surface of semiconductor substrate (10). The resulting nanowires (104) are suitable for use in semiconductor devices.