发明名称 SCHOTTKY POWER DIODE COMPRISING A SICOI SUBSTRATE AND THE METHOD OF PRODUCING ONE SUCH DIODE
摘要 <p>The invention relates to a power junction device comprising: a SiCOI-type substrate with a silicon carbide layer (16) which is insulated from a solid support (12) by means of an insulating buried layer (14), and at least one Schottky contact between a first metallic layer (40) and the silicon carbide surface layer (16), said first metallic layer (30) forming an anode.</p>
申请公布号 WO2003077321(P1) 申请公布日期 2003.09.18
申请号 FR2003000787 申请日期 2003.03.12
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