| 摘要 |
<p>With conventional analysis data, it is difficult to decide whether the change serving as a judgment reference for a seasoning end is a change caused by the seasoning, i.e., a change based on the state change in a processing vessel or a change based on a temperature change between dummy wafers and to decide whether the seasoning itself is completed. According to the plasma processing method of the present invention, a method for detecting a seasoning end when performing seasoning by supplying a dummy wafer (W) into a processing vessel (2) of a plasma processing device (1) includes a step of supplying a dummy wafer (W) into the processing vessel (2), cooling the interior of the processing vessel (2), and performing multivariate analysis using a plurality of measurement data obtained when a plurality of dummy wafers (W) are supplied again into the processing vessel (2) so as to create a prediction equation for predicting the seasoning end and a step of detecting a seasoning end when performing the seasoning according to the prediction equation.</p> |
