发明名称 Solder deposition on wafer backside for thin-die thermal interface material
摘要 A solder is deposited on the backside of a wafer. The wafer can be pre-deposited with a barrier layer such as a titanium base and other materials. Deposition is carried out by electroplating, electroless plating, chemical vapor deposition, and physical vapor deposition. The solder-deposited die is bonded with a heat spreader that did not require a pre-deposited solder.
申请公布号 US7288438(B2) 申请公布日期 2007.10.30
申请号 US20050116554 申请日期 2005.04.28
申请人 INTEL CORPORATION 发明人 LU DAOQIANG
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利