发明名称 GAS MIXER, GAS REACTOR AND SURFACE MODIFYING DEVICE
摘要 <p>A gas mixer capable of producing a uniformly mixed uniformly heated mixed gas or reaction gas; and a gas reactor. The gas mixer or gas reactor is characterized by comprising a mixing flow path consisting of a circumferentially communicating annular flow path, a plurality of inflow ports and outflow ports formed in the annular flow path such that their positions in the annular flow path are circumferentially staggered, and a plurality of communication flow paths communicating with the inflow ports or outflow ports formed in the annular flow path; and a feed flow path and a delivery flow path for fluid that communicate with the mixing flow path. Further, a surface modifying device is characterized by connecting this gas reactor to an accumulation chamber.</p>
申请公布号 WO2003076059(P1) 申请公布日期 2003.09.18
申请号 JP2003002722 申请日期 2003.03.07
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