发明名称 Photosensitive resin composition, dry film, and workpiece using the same
摘要 A photosensitive resin composition which contains (A) polyamic acid, (B) (meth)acrylate having at least two photopolymerizable C=C unsaturated double bonds, (C) a photopolymerization initiator and (D) a flame retardant, with the (meth)acrylate (B) having at least two photopolymerizable C=C unsaturated double bonds being contained in an amount of 10 to 700 parts by weight based on 100 parts by weight of the polyamic acid (A).
申请公布号 US2003176528(A1) 申请公布日期 2003.09.18
申请号 US20020301731 申请日期 2002.11.22
申请人 MITSUI CHEMICALS, INC. 发明人 TAHARA SYUJI;OHKAWADO ETSUO;MORITA MORITSUGU;FUJITA KAZUHITO;TSUDA TAKESHI
分类号 B32B3/00;B32B7/00;B32B15/00;C08J3/28;C08K3/00;C08L79/04;G03F7/027;G03F7/037;G03F7/038;(IPC1-7):C08J3/28 主分类号 B32B3/00
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