发明名称 |
Photosensitive resin composition, dry film, and workpiece using the same |
摘要 |
A photosensitive resin composition which contains (A) polyamic acid, (B) (meth)acrylate having at least two photopolymerizable C=C unsaturated double bonds, (C) a photopolymerization initiator and (D) a flame retardant, with the (meth)acrylate (B) having at least two photopolymerizable C=C unsaturated double bonds being contained in an amount of 10 to 700 parts by weight based on 100 parts by weight of the polyamic acid (A).
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申请公布号 |
US2003176528(A1) |
申请公布日期 |
2003.09.18 |
申请号 |
US20020301731 |
申请日期 |
2002.11.22 |
申请人 |
MITSUI CHEMICALS, INC. |
发明人 |
TAHARA SYUJI;OHKAWADO ETSUO;MORITA MORITSUGU;FUJITA KAZUHITO;TSUDA TAKESHI |
分类号 |
B32B3/00;B32B7/00;B32B15/00;C08J3/28;C08K3/00;C08L79/04;G03F7/027;G03F7/037;G03F7/038;(IPC1-7):C08J3/28 |
主分类号 |
B32B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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