发明名称 REDUCED STRIAE EXTREME ULTRAVIOLEGT LITHOGRAPHIC ELEMENTS, A METHOD OF MANUFACTURING THE SAME AND A METHOD OF MEASURING STRIAE
摘要 <p>Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.</p>
申请公布号 WO2003077038(P1) 申请公布日期 2003.09.18
申请号 US2003006825 申请日期 2003.03.04
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