PLASMA PROCESSING DEVICE AND PLASMA GENERATING METHOD

摘要

A plasma processing device, wherein the lengths L of slots (26) are monotonously increased from the center part (A) of an antenna surface (28) in an outer radial direction and maximized at a first intermediate part (C) and the maximum lengths are maintained from the first intermediate part (C) to a peripheral edge part (B) to increase a radiation power by a slot antenna as compared with a case when the lengths L are monotonously increased from the center part of the antenna surface (28) to the peripheral edge part thereof, whereby a reflected power from the slot antenna is reduced since the power remaining in the slot antenna is reduced without being radiated from the slot antenna.