| 摘要 |
A manipulator for extracting positive ions from ions generated in an ion source unit of an ion implanter is provided to improve efficiency of ion beams and to reduce errors by placing the manipulator at a specific location of an inner wall of an ion source unit to avoid changes of an installation angle. An ion source unit(100) has a manipulator(200) composed of a suppression electrode(210), a ground electrode(230), and an insulation material(250) between the electrodes for extracting positive ions, a main frame(101) of the ion source unit, and a source arc chamber(110).
|
