发明名称 |
1,2-Naphthoquinone-2-Diazidesulfonate Ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition |
摘要 |
The invention provides a 1,2-naphthoquinone-2-diazidesulfonate ester photosensitive agent which is useful as a photosensitive agent employed in a photoresist for producing semiconductor integrated circuits, liquid crystal displays, EL displays, etc., a method for producing the photosensitive agent, and a photoresist composition containing the photosensitive agent. The 1,2-naphthoquinone-2-diazidesulfonate ester photosensitive agent is produced by reacting a polyhydric phenol with 1,2-naphthoquinone-2-diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyhydric phenol is obtained by a condensation reaction between resorcinol and at least one aldehyde selected from C3-C10 aldehydes, and contains, as a predominant component, a compound represented by formula (I) and components exhibiting a retention time as measured by using GPC shorter than that of the compound represented by formula (I) in an amount of 10% or less: <CHEM> wherein each of R1, R2, R3, and R4 represents a C2-C9 alkyl group.
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申请公布号 |
EP1345080(A2) |
申请公布日期 |
2003.09.17 |
申请号 |
EP20030005533 |
申请日期 |
2003.03.11 |
申请人 |
TOYO GOSEI KOGYO CO., LTD. |
发明人 |
IIDA, HIROTADA;SUWA, MIHARU;HAGIWARA, YUICHI;TADA, KATSUMI;KATORI, SUEHIRO;MIYAZAKI, TSUNEAKI |
分类号 |
G03F7/023;C07C309/76;G03F7/022;(IPC1-7):C07C309/76 |
主分类号 |
G03F7/023 |
代理机构 |
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地址 |
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