| 摘要 |
A laser annealing system and apparatus, which includes a laser light source, which emits a laser beam through an a-Si layer on a substrate, an optical unit which forms an optical path along which the laser beam is transmitted through a subject to be annealed, and a first reflecting component, which reflects the laser beam that has been transmitted through the subject so that a direction of the laser beam is reversed along the optical path along which the laser beam is transmitted through the subject, to irradiate the subject. Since an operation in which energy is absorbed is repeated plural times when the laser beam is transmitted through the a-Si layer, input energy of the laser beam can be utilized without waste.
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