| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing device provided with a supporting method and a means preventing occurrence of destruction of a work and without a necessity of frequent replacement of a supporting roller in the polishing device without a necessity of providing an exclusive driving means for rotating and driving the work, and capable of moving a dress unit for upper and lower surface plates to a dressing position without providing a special driving means. <P>SOLUTION: The circular plate-like work is sandwiched between upper and lower polishing surface plates 411, 421, guided by a guide/polishing block 51 and rotated around the center of the work W. The center of the work and the centers of the upper and lower polishing surface plates 411, 421 are shifted from each other, and also one center is swung and moved. The polishing of the plane and circumferential surface of the work W is finished at the same time according to displacement, swinging distance and the other adjustment. <P>COPYRIGHT: (C)2003,JPO |
