| 摘要 |
The invention relates to a method for washing instruments used in semiconductor industry with an inflammable and/or explosive washing liquid. The instruments washed applying the method are placed into a substantially gas-tightly closed washing space (2), the air contained in the space being removed by supplying an inert gas or gas mixture to the space, while allowing, at the same time, the gas mixture containing air to be discharged from the washing space. The instruments (3) are washed by spraying them with the washing liquid. After the washing, the washing liquid is removed from the washing space and the gas mixture generated in the washing space which contains vapours from the washing liquid is removed by supplying an inert gas/gas mixture to the washing space and discharging, at the same time, the gas mixture containing washing liquid vapours out of the washing space. The invention further relates to an equipment comprising a substantially gas-tightly closed washing space (2) where the instruments (3) to be washed are placed for the washing. The equipment also includes means (4), (7) for spraying washing liquid onto the instruments and means (10 to 12) for supplying an inert gas/gas mixture to the washing space. The equipment further comprises means for removing a gaseous mixture from the washing space, and control means for controlling the equipment.
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