发明名称 Apparatus for fabricating encapsulated micro-channels in a substrate
摘要 An apparatus for fabricating encapsulated micro-channels in a substrate is described. The apparatus includes the formation of a thin film layer over an area of a substrate. Following the formation of the thin layer, a periodic array of access windows are formed within the thin film layer along dimensions of one or more desired micro-channels. Following formation of the access windows, the one or more micro-channels are formed within an underlying layer of the substrate. Finally, the one or more micro-channels are encapsulated, thereby closing the one or more access windows along the dimensions of the desired micro-channels. Accordingly, the apparatus is suitable in one context for rapid prototyping of micro-electromechanical systems in the areas of, for example, RF micro-systems, fluidic micro-systems and bio-fluidic applications. In addition, the apparatus enables the rapid prototyping of integrated circuits.
申请公布号 US6621174(B2) 申请公布日期 2003.09.16
申请号 US20020196306 申请日期 2002.07.15
申请人 INTEL CORPORATION 发明人 ROWLETTE JEREMY A.;WINER PAUL
分类号 B81B1/00;B81C1/00;(IPC1-7):H01L23/58 主分类号 B81B1/00
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