METHOD OF DESIGNING/MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE USING COMBINED EXPOSURE PATTERN AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE,申请号KR20010026938-传众专利搜索

发明名称	METHOD OF DESIGNING/MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE USING COMBINED EXPOSURE PATTERN AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
摘要
申请公布号	KR100857634(B1)	申请公布日期	2008.09.08
申请号	KR20010026938	申请日期	2001.05.17
申请人		发明人
分类号	H01L21/8246	主分类号	H01L21/8246
代理机构		代理人
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