| 发明名称 |
Target sidewall design to reduce particle generation during magnetron sputtering |
| 摘要 |
An apparatus for a physical vapor deposition system includes a target having a sidewall having an undercut thereon defining a net erosion area and a net redeposition area.
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| 申请公布号 |
US6620296(B2) |
申请公布日期 |
2003.09.16 |
| 申请号 |
US20010905263 |
申请日期 |
2001.07.13 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
GOGH JAMES VAN;THOMPSON JIM;SCHWEITZER MARC;TANAKA YOICHIRO;LIU ALAN;CHAN ANTHONY CT;BROWN KARL;FORSTER JOHN C. |
| 分类号 |
C23C14/34;C23C14/56;H01L21/285;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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