| 摘要 |
With respect to a projection exposure apparatus in which a reticle is illuminated with an exposure beam and a wafer is exposed with the exposure beam via a projection optical system, the projection optical system is mounted on a frame mechanism slidable on a level block, and a wafer stage system is provided, on the level block, inside of the frame mechanism. Further, in order to pull the projection optical system out of the main body of the projection exposure apparatus, an adjustment table is provided separately from the level block, and after the wafer stage system being moved, the frame mechanism is moved onto the adjustment table, in a state that the frame mechanism is supporting the projection optical system.
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