| 摘要 |
A projection exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a photosensitive substrate. The projection optical system includes at least three lens units, including a lens unit of a positive refractive power and a lens unit of a negative refractive power, and an aspherical lens having aspherical surfaces formed on both sides thereof, in which a relation |Lxø0|>17 is satisfied, where L is a conjugate distance of the projection optical system and ø0 is the total power of the negative lens unit or of negative lens units of the projection optical system. Each aspherical surface of said aspherical surface lens is disposed at a position satisfying a relation |hb/h|>0.36 where h is a height of an axial marginal light ray, and hb is a height of a most abaxial chief ray, and each aspherical surface of the aspherical surface lens satisfies a relation |DELTAASPH/L|>1.0x10-6 where DELTAASPH is an aspherical amount of the aspherical surface.
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