发明名称 |
Method and apparatus for inspecting defects in a patterned specimen |
摘要 |
In a method and apparatus for detecting pattern defects, a UV laser is focused on a pupil of an objective lens and scanned; the focused and scanned UV lens illuminates a specimen on which patterns are formed; the specimen illuminated by the UV laser is imaged: and the resulting image of the specimen is compared with a previously stored reference image. The specimen illuminated by UV light is imaged using an anti-blooming time delay integration image sensor or a back-illumination time delay integration image sensor; and the resulting specimen image is compared with a previously stored reference image.
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申请公布号 |
US6621571(B1) |
申请公布日期 |
2003.09.16 |
申请号 |
US20000698167 |
申请日期 |
2000.10.30 |
申请人 |
HITACHI, LTD. |
发明人 |
MAEDA SHUNJI;YOSHIDA ATSUSHI;SHIBATA YUKIHIRO;NAKATA TOSHIHIKO;SHISHIDO HIROAKI;YOSHIDA MINORU;UTO SACHIO |
分类号 |
G01N21/95;G01N21/956;(IPC1-7):G01N21/88 |
主分类号 |
G01N21/95 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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