发明名称 Substrate having fine line, electron source and image display apparatus
摘要 As a substrate having a fine line and capable of suppressing crack generation in the substrate and peeling of the fine line, the invention discloses a configuration in which plural recesses are arranged on the fine line, and particularly a configuration in which the interval of the plural recesses does not exceed 200 mum. There is also disclosed a configuration in which the plural recesses are arranged along a direction crossing the longitudinal direction of the fine line.
申请公布号 US6621207(B2) 申请公布日期 2003.09.16
申请号 US20010014398 申请日期 2001.12.14
申请人 CANON KABUSHIKI KAISHA 发明人 UDA YOSHIMI;ISHIWATA KAZUYA;KUBO SHINSAKU;WATANABE YASUYUKI
分类号 H01J29/04;H01J1/316;H01J29/02;H01J31/12;H05K1/02;H05K1/09;H05K3/24;(IPC1-7):H01J1/62 主分类号 H01J29/04
代理机构 代理人
主权项
地址