| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an improved retainer for a subject to be polished, capable of reducing handling time of an operator's carrier unit, thus attaining reduction in manufacturing cost. <P>SOLUTION: A back pad 3 retaining the subject 50 to be polished from downward is provided on a base substrate 10. A carrier 2 having an opening 2a for retaining the outer periphery of the object 50 to be polished is provided on the back pad 3. The base substrate 10 and the carrier 2 are fixed by double- faced tapes 30, 31 so as to integrate the carrier 2 with the back pad 3. <P>COPYRIGHT: (C)2003,JPO |
