CVD APPARATUS

摘要

PURPOSE: A CVD(Chemical Vapor Deposition) apparatus is provided to exchange easily a feedthrough by dividing the feedthrough for grounding a process chamber into two parts and combining the divided parts to each other. CONSTITUTION: A CVD apparatus includes a process chamber, a bottom plate, a heater block, and a feedthrough. The feedthrough is divided into a heater block connection portion(160) and a power connection portion(170). The heater block connection portion(160) includes a head portion(162) and a bar-shaped body(164). The head portion(162) is connected to a side of the heater block through a flexible strap. A combination portion(166) is formed at an end portion of the bar-shaped body(164) opposite to the bottom plate. The power connection portion(170) includes an insertion groove(172) and a male screw thread(176). The combination portion(166) is combined with the insertion groove(172). The male screw thread(176) is combined with a power source portion.