| 摘要 |
PURPOSE: An exposure apparatus and a method using a patterned emitter are to provide 1:1 or x:1 transcription of a desired pattern on a substrate, by using a magnet, apparatus for generating a direct current magnetic field or deflection apparatus to control an electron beam so that emitted electron beam is prevented from spreading out. CONSTITUTION: A desired pattern is formed on the surface of a planar emitter(3) facing a substrate holder(61) wherein the planar emitter is made of a superconductor or ferroelectric material, disposed at a predetermined interval from the substrate holder. A heat source(1) heats the planar emitter. The magnet or apparatus for generating the direct current magnetic field is disposed in the outer of the substrate holder and the emitter to control the path of electrons emitted from the planar emitter.
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