发明名称 MASS ANALYZER OF SEMICONDUCTOR ION IMPLANTER
摘要 PURPOSE: A mass analyzer of a semiconductor ion implanter is provided to be capable of preventing pollutions of a controller caused by leak in a cooling water supply and exhaust line. CONSTITUTION: A mass analyzer comprises a coil part(30,32), a cooling water supply and exhaust line(36,40), a cation mobile path(34), a controller(44), a leak cover(46) and a leak detector(48). The coil part(30,32) are formed at the upper and lower portion of a cation mobile path(34). The cooling water supply and exhaust line(36,40) are formed at both sides of the coil part. The controller(44) is formed at the lower portion of the coil part. The leak cover(46) is covered to the controller. The leak detector(48) is formed on the leak cover.
申请公布号 KR20030072105(A) 申请公布日期 2003.09.13
申请号 KR20020011672 申请日期 2002.03.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO, HYEON JUNG
分类号 H01L21/265;(IPC1-7):H01L21/265 主分类号 H01L21/265
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