发明名称 AN APPARATUS AND METHOD FOR MEASURING A PROPERTY OF A LAYER IN A MULTILAYERED STRUCTURE
摘要 <p>An apparatus measures a property of an optically absorbing layer (416) by using a lens (415) to focus a heating beam (403) for a laser (401) on a region of the layer (416), modulating the power from a laser driver circuit (421) to the laser to modulate the heating beam (403) at a predetermined frequency that is selected to be sufficiently low to ensure that at any time the temperature of the layer is approximately equal to a temperature of the layer when heated by an unmodulated beam, and using a detector (420) to measure the power of another beam from another laser (405) that is reflected from the heated region. The measurement can be used to adjust a process parameter that controls a fabrication process.</p>
申请公布号 WO2003075321(P1) 申请公布日期 2003.09.12
申请号 US2003006239 申请日期 2003.02.28
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