| 发明名称 |
SYSTEM AND METHOD FOR PROTECTING RETICLE USING TWO-PART COVER |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a system and a method for protecting a mask from being contaminated by airborne particles. <P>SOLUTION: These system and method include a step of providing a reticle which is fixed inside a two-part cover. The two-part cover includes a removable protection device for protecting the reticle from contaminants. The cover is held inside a pod or box, which may be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover may be removed during an exposure process, during which a pattern on the reticle is formed on a wafer. <P>COPYRIGHT: (C)2003,JPO</p> |
| 申请公布号 |
JP2003257852(A) |
申请公布日期 |
2003.09.12 |
| 申请号 |
JP20030046630 |
申请日期 |
2003.02.24 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
DEL PUERTO SANTIAGO;MASSAR ANDREW;ALIKHAN ABDULLAH;FEROCE JONATHAN H;LOOPSTRA ERIC R;KISH DUANE P;OLSON WOODROW J |
| 分类号 |
B65G49/07;G03B27/42;G03B27/48;G03B27/58;G03F1/24;G03F1/62;G03F1/64;G03F1/66;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 |
主分类号 |
B65G49/07 |
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