发明名称 DIRECT EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To highly reliably perform high-accuracy exposure at the time of performing exposure by using a DMD (digital micro-mirror device). SOLUTION: An abnormality of a DMD (6) is detected from an output signal of a photosensor (8) by inclining a plurality of micro-mirrors of the DMD (6) in accordance with inspection pattern data by inputting the inspection pattern data to the DMD (6) as electric signals and receiving reflected light rays from the micro-mirrors by means of the photosensor (8). The photosensor (8) can be positioned on the routes of the reflected light rays from the micro-mirrors of the DMD (6), and can be retreated from the routes of the reflected light rays. Alternatively, a reflecting mirror can be positioned on the routes of the reflected light rays from the micro-mirrors so as to reflect the reflected light rays to the photosensor (8). COPYRIGHT: (C)2003,JPO
申请公布号 JP2003257844(A) 申请公布日期 2003.09.12
申请号 JP20020061339 申请日期 2002.03.07
申请人 M S TEC:KK 发明人 CHIGI YOSHITAKA
分类号 G03F7/20;G02B27/18;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
代理机构 代理人
主权项
地址