| 发明名称 |
PROCESS FOR OPTICALLY ERASING CHARGE BUILDUP DURING FABRICATION OF AN INTEGRATED CIRCUIT |
| 摘要 |
A process for optically reducing charge build-up in an integrated circuit includes exposing the integrated circuit or portions thereof to a broadband radiation source. The process effectively reduces charge buildup that occurs in the manufacture of integrated circuits. |
| 申请公布号 |
WO03049182(A3) |
申请公布日期 |
2003.09.12 |
| 申请号 |
WO2002US38310 |
申请日期 |
2002.12.02 |
| 申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
JANOS, ALAN;BERRY, IVAN;SINNOTT, ANTHONY;STEWART, KEVIN |
| 分类号 |
H01L21/02;H01L21/268;H01L21/28;H01L21/336 |
主分类号 |
H01L21/02 |
| 代理机构 |
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