| 摘要 |
PROBLEM TO BE SOLVED: To obtain a semiconductor manufacturing system in which slip-free heat treatment of a wafer is realizing. SOLUTION: The semiconductor production system comprises a plurality of lamps having a wavelength of 10,000 nm or less as the heat source of heat treatment, and a rotating tank of disc having a clamp inclining by 7 deg or above and rotating at 10 Hz or above. COPYRIGHT: (C)2003,JPO
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