发明名称 VACUUM TREATING DEVICE AND METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To raise productivity and quality of a vacuum treatment which is performed to a treating base body. SOLUTION: There are provided a vacuum envelop 9 for performing a vacuum treatment to a base body 3, a gas supply device 10 for supplying a treating gas into this vacuum envelop 9, a first exhaust system 11 for evacuating the treating gas supplied into the vacuum envelop 9 at a vacuum treatment to hold constant a pressure in the vacuum envelop 9, and a second exhaust system 12 for evacuating the inside of a gas supply path in the gas supply device 10. Further, there are provided a first connection part 16 for connecting the vacuum envelop 9 to the gas supply device 10, a second connection part 17 for connecting the vacuum envelop 9 to the first exhaust system 11, and a third exhaust system 13 for evacuating the first and the second connection parts 16, 17, respectively. The first, the second and the third exhaust systems 11, 12, 13 are provided so as to operate independently, respectively. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003257877(A) 申请公布日期 2003.09.12
申请号 JP20020061564 申请日期 2002.03.07
申请人 CANON INC 发明人 TAZAWA DAISUKE;KARAKI TETSUYA;KATAGIRI HIROYUKI
分类号 G03G5/08;C23C16/455;H01L21/205;(IPC1-7):H01L21/205 主分类号 G03G5/08
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