| 摘要 |
PROBLEM TO BE SOLVED: To provide a particle injection device for injecting a large amount of low-energy particles evenly to a basal plate. SOLUTION: This particle injection device has a target 2 for spatter, an ion beam source 6 which generates a spatter particle 10 by irradiating the target 2 with an ion beam 8 in a sheet form, which is broad in the X direction, a target scanning mechanism 4 which reciprocatively scans in a mechanical fashion mechanically in the Y direction crossing the target 2 in the X direction while maintaining the angle with the ion beam 8 at constant angle, a slit plate 12 with a slit 14, which is long in the X direction, through which the spatter particle 10 generated from the target 2 passes, a holder 18 to hold a basal plate 16 at the position where the spatter particle 10 passing through the slit 14 enters, and a holder scanning mechanism 20 which reciprocatively scans mechanically in the Z direction crossing the holder 18 both in the X and Y directions. COPYRIGHT: (C)2003,JPO
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