| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high frequency power supply device for a plasma generating device capable of enhancing the output accuracy of the high frequency output emitted intermittently. <P>SOLUTION: The high frequency power supply device includes a first control loop (22, 24, 29) furnished with a peak value sensing part to sense the peak value of the high frequency output emitted intermittently and an output control part 22 which compares the peak value sensed by the sensing part with the set value of the output peak predetermined and controls the output peak to the set value and a second control loop (24, 28, 35a) equipped with a monitor part to sense the mean of the high frequency output emitted intermittently, a calculating means to calculate the mean of the high frequency output on the basis of the set value of peak and the duty ratio set value, and a pulse generation part 35 to generate modulation reference signals for controlling a modulation part on the basis of the mean of the high frequency output sensed by the monitor part and the mean of the high frequency output calculated by the calculating means. <P>COPYRIGHT: (C)2003,JPO |
