发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which can prevent the characteristics of a ferroelectric capacitor from being deteriorated. SOLUTION: The semiconductor device comprises an insulating film 22 formed on a semiconductor substrate, a lower electrode 23 of the capacitor formed on the film 22, a dielectric film 4 of the capacitor formed on the electrode 23, an upper electrode 25 of the capacitor formed on the film 24, and a protective insulating film 28 covering the electrode 25 and the film 24 and covering a part of the electrode 23. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003258205(A) 申请公布日期 2003.09.12
申请号 JP20020057788 申请日期 2002.03.04
申请人 FUJITSU LTD 发明人 OZAWA SOICHIRO;CROSS JEFFREY SCOTT;HORII YOSHIMASA
分类号 H01L21/302;H01L21/3065;H01L21/8246;H01L27/105;(IPC1-7):H01L27/105;H01L21/306 主分类号 H01L21/302
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