| 摘要 |
PROBLEM TO BE SOLVED: To measure focus leveling precisely on the periphery of a wafer so as to solve the problem about the fact that a pattern gets blurred by defocusing. SOLUTION: When an adjacent shot 4a of a wafer 3 is exposed, surface condition of the adjacent shot 4a is measured by a pre-sensor 7 or a main sensor 8, and the surface condition of a part of a peripheral shot 4b adjacent to the adjacent shot 4a is measured by a near sensor 9. Focus leveling is carried out for the peripheral shot 4b on the basis of the measurement results of the measured surface conditions of the adjacent shot 4a and the part of the peripheral shot 4b. COPYRIGHT: (C)2003,JPO
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