| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing apparatus for an optical master disk and a manufacturing method for the optical master disk capable of improving productivity by enabling electron beam plotting at a high speed and improving the operation reliability of the apparatus. SOLUTION: In the manufacturing apparatus for the optical master disk, as the characteristics of a means 1 for irradiating a resist layer 102 composed of the electron beam photosensitive resist of the optical master disk with converged electron beams, the maximum acceleration voltage of the electron beam 2 is≤15 kV, an electron beam spot diameter in an irradiation beam current 80 nA is≤80 nm, and a beam blanking frequency is≥50 MHz. Also, the resist layer 102 composed of the electron beam photosensitive resist is formed on a substrate 101, alignment is performed by irradiating the resist layer 102 with the electronic beam under the conditions that the acceleration voltage is≤15 kV and the blanking frequency of the electron beam is≥50 MHz by using an electron beam plotting device in which the electronic beam spot diameter in the irradiation beam current 80 nA is≤80 nm, a prescribed pattern is formed by developing the resist layer 102 thereafter and thus the optical master disk is manufactured. COPYRIGHT: (C)2003,JPO
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