| 摘要 |
<p>An apparatus for manufacturing a semiconductor or a liquid crystal, which has a reaction vessel (9) and, disposed therein, a ceramic holder (1) having a resistance heating element (3) buried in the inside thereof and a cylindrical supporting member (2) which supports the ceramic holder (1) with one end (2a) thereof and has the other end (2b) fixed to the reaction vessel (9), wherein the one end (2a) of the cylindrical supporting member (2) is joined gas-tightly to the ceramic holder (1) and the other end (2b) is gas-tightly sealed with a partition plate (6) and a sealing agent (7) inside the cylindrical member. In the apparatus, the space within the cylindrical supporting member (2) partitioned by the ceramic holder (1) and partition plate (6) is preferably maintained under vacuum or in an inert gas atmosphere under reduced pressure. The apparatus for manufacturing a semiconductor or a liquid crystal allows the operation for gas-tight sealing of the cylindrical supporting member to be performed with ease, allows the prevention of corrosion and oxidation of an electrode terminal (4) being exposed on the back face of the ceramic holder, the enhancement of temperature uniformity of the holder and the improvement of heat efficiency, and further allows the miniaturization of the reaction vessel through the decrease of the length of the cylindrical supporting member.</p> |
