发明名称 DEVICE AND SYSTEM FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To prevent defectively-treated substrates from flowing out to succeeding processes by quickly specifying the substrates affected by an abnormality causing an alarm and cause of the abnormality when the alarm is generated in a substrate treating device. SOLUTION: The treating state of each treatment unit constituting the substrate treating device is monitored. When the alarm is generated as a monitored result, not only data used for identifying treatment unit contributing to the alarm, but also the data specifying the substrates treated by means of the treatment unit and information on monitored results including the supervisory data of the substrate treatment performed by means of the treatment unit are preserved and, at the same time, visually displayed on a monitor. Consequently, an operator of the substrate treating device can quickly specify the substrates which may be treated defectively and can quickly grasp treated states of the substrates. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003257837(A) 申请公布日期 2003.09.12
申请号 JP20020058446 申请日期 2002.03.05
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YAMAMOTO SATOSHI;AKIYAMA KAZUYA
分类号 H01L21/677;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 H01L21/677
代理机构 代理人
主权项
地址