METHOD FOR DIAMOND COATING SUBSTRATES

摘要

The invention relates to a method for diamond coating substrates, wherein the substrate is exposed to a reactive gas mixture excited by means of a plasma discharge in a vacuum atmosphere, wherein the plasma discharge comprises at least one plasma jet (14) in an evacuated recipient (16) that is formed between a cathode chamber (1) and an anode (2). The reactive gas mixture comprises a reactive gas and a working gas, wherein the reactive gas in (9) and the working gas in (8) and/or (9) are injected into the recipients, the recipient (16) is pumped out by means of a pump arrangement (15) and the hydrogen concentration of the reactive gas mixture is 0-45 percent per volume.