METHOD FOR REDUCING THE TRAP DENSITY IN A SEMICONDUCTOR WAFER,申请号KR20077017943-传众专利搜索

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发明名称	METHOD FOR REDUCING THE TRAP DENSITY IN A SEMICONDUCTOR WAFER
摘要
申请公布号	KR100905976(B1)	申请公布日期	2009.07.06
申请号	KR20077017943	申请日期	2007.08.03
申请人		发明人
分类号	H01L21/324;H01L21/28	主分类号	H01L21/324
代理机构		代理人
主权项
地址

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