发明名称 Reflective ohmic contacts for silicon carbide including a layer consisting essentially of nickel, methods of fabricating same, and light emitting devices including the same
摘要 Reflective ohmic contacts for n-type silicon carbide include a layer consisting essentially of nickel on the silicon carbide. The layer consisting essentially of nickel is configured to provide an ohmic contact to the silicon carbide, and to allow transmission therethrough of optical radiation that emerges from the silicon carbide. A reflector layer is on the layer consisting essentially of nickel, opposite the silicon carbide. A barrier layer is on the reflector layer opposite the layer consisting essentially of nickel, and a bonding layer is on the barrier layer opposite the reflector layer. It has been found that the layer consisting essentially of nickel and the reflector layer thereon can provide a reflective ohmic contact for silicon carbide that can have low ohmic losses and/or high reflectivity.
申请公布号 US2003168663(A1) 申请公布日期 2003.09.11
申请号 US20030368063 申请日期 2003.02.14
申请人 SLATER DAVID B.;HAGLEITNER HELMUT 发明人 SLATER DAVID B.;HAGLEITNER HELMUT
分类号 H01L21/04;H01L33/20;H01L33/34;H01L33/40;H01L33/50;(IPC1-7):H01L31/031 主分类号 H01L21/04
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