Manufacture of holographic test lens by superposing plane-parallel light wave and divergent light wave to expose concentric interference patterns on substrate to which resist layer is applied

摘要

Grating structures are exposed in a photosensitive resist layer applied to a substrate (7) using an interferometric structure. By superposing a plane-parallel light wave (10a) and a convergent or divergent light wave (10b), concentric interference patterns are exposed on the substrate. The resist layer is developed photographically, to produce a substantially sinusoidal relief in the surface of the resist layer.