Methods of forming fuse box guard rings for integrated circuit devices

摘要

The present invention provides methods of forming fuse box guard rings for integrated circuits and integrated circuit devices having the same. A fuse line is formed at a fuse portion of an integrated circuit device and a first insulating layer is formed on the fuse line. A guard ring pattern that encloses the fuse line is formed on the first insulating layer. A second insulating layer is formed on the guard ring pattern and the first insulating layer. The second insulating layer is partially etched to remove a portion of the second insulting layer in the fuse portion of the integrated circuit device enclosed by the guard ring pattern exposing a portion of the first insulating layer and to form a via hole in a peripheral circuit region of the integrated circuit device.