发明名称 Surface emitting semiconductor laser and process for producing the same
摘要 A surface emitting semiconductor laser includes a substrate, a first semiconductor multilayer reflector formed on the substrate, an active region formed on the first semiconductor multilayer reflector, a second semiconductor multilayer reflector formed on the active region, a current confinement layer interposed between the first and second semiconductor multilayer reflectors and partially including an oxide region, and an insulating layer formed on a coated surface provided by a semiconductor layer which is part of the first semiconductor multilayer reflector and is revealed after removal of a surface oxidation layer.
申请公布号 US2003169795(A1) 申请公布日期 2003.09.11
申请号 US20020315152 申请日期 2002.12.10
申请人 FUJI XEROX CO., LTD. 发明人 OTOMA HIROMI;SAKURAI JUN
分类号 H01S5/183;H01S5/343;(IPC1-7):H01S5/00;H01S3/08 主分类号 H01S5/183
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