| 发明名称 |
Method and apparatus for generating H20 to be used in a wet oxidation process to form SiO2 on a silicon surface |
| 摘要 |
Chemical generator and method for generating a chemical species at a point of use such as the chamber of a reactor in which a workpiece such as a semiconductor wafer is to be processed. The species is generated by creating free radicals, and combining the free radicals to form the chemical species at the point of use.
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| 申请公布号 |
US2003170153(A1) |
申请公布日期 |
2003.09.11 |
| 申请号 |
US20030336483 |
申请日期 |
2003.01.03 |
| 申请人 |
BAR-GADDA RONNY |
发明人 |
BAR-GADDA RONNY |
| 分类号 |
H05H1/46;B01J19/08;C01B7/01;C01B7/19;C01B17/76;C01B21/068;C01B21/26;C01B21/30;C01B33/02;C23C16/448;G03F7/42;H01L21/302;H01L21/3065;H01L21/31;H01L21/311;H05H1/24;(IPC1-7):B01J19/08;B01J19/12 |
主分类号 |
H05H1/46 |
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