发明名称 Verfahren und Zusammensetzungen zur Herstellung von Kupferoberflächen mit verbesserter Haftung und damit hergestellte Gegenstände
摘要 <p>This invention relates to a method of forming a substrate with preparing a surface capable of making a cocontinuous bond comprising the steps of 1) obtaining a copper or copper alloy substrate and 2) applying an etching composition which comprises (a) an acid, (b) an oxidizing agent, (c) a copper complexing agent, and (d) a copper complex, wherein the copper complex is present in an amount which precipitates when applied to the copper or copper alloy substrate. The method also includes the step of 3) treating the substrate with a coating composition and/or 4) applying a stripping composition to the substrate. The invention also relates to copper articles, having surface porosity, including multilayer articles such as printed circuit boards and compositions used in the method. The present invention provides microporous copper or copper alloy substrates which have improved adhesion properties to organic material.</p>
申请公布号 DE69809382(T2) 申请公布日期 2003.09.11
申请号 DE1998609382T 申请日期 1998.12.17
申请人 ATOTECH DEUTSCHLAND GMBH 发明人 BISHOP, CRAIG V.;BOKISA, GEORGE S.;DURANTE, ROBERT J.;KOCHILLA, JOHN R.
分类号 C23F1/18;H05K3/38;H05K3/46;(IPC1-7):C23F1/18 主分类号 C23F1/18
代理机构 代理人
主权项
地址