| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified resist composition useful in microfabrication using far UV such as KrF or ArF excimer laser or vacuum UV such as F<SB>2</SB>excimer laser. <P>SOLUTION: The resist composition comprises a fluoropolymer (A) having a repeating unit in which a fluorine-containing diene has been cyclopolymerized and a repeating unit in which an acrylic monomer has been polymerized and also having a blocked acidic group, an acid generating compound (B) which generates an acid upon irradiation with light and an organic solvent (C). <P>COPYRIGHT: (C)2003,JPO |
