发明名称 X-RAY SPECTROSCOPY ELEMENT AND X-RAY FLUORESCENCE SPECTROMETER
摘要 PROBLEM TO BE SOLVED: To provide an X-ray spectroscopy element, capable of sufficiently removing hazardous X-ray maintaining sufficient intensity of the main reflected rays. SOLUTION: The X-ray spectroscopy element 4 is constituted by layering a multitude of layer pairs, consisting of a reflection layer 4a and a spacer layer 4b on a substrate 4c and is provided with two multiple layer films 4e, consisting of a single or a plurality of layer pairs having a specific period length (d). In order that X-rays having desired energy among the X-rays reflected at the first multiple layer film 4e<SB>1</SB>on the substrate 4c side is removed by interfering with the X-ray reflected by the second multiple layer film 4e<SB>2</SB>be on the incidence surface 4f side, a specific period length d<SB>2</SB>or the material of the reflection layer 4a or the material of the spacer layer 4b are different from the first layer multiple layer film 4e<SB>1</SB>and layer pair number in the second multiple layer film 4e<SB>2</SB>is set. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003255090(A) 申请公布日期 2003.09.10
申请号 JP20020058660 申请日期 2002.03.05
申请人 RIGAKU INDUSTRIAL CO 发明人 DOUI MAKOTO;YAMADA TAKASHI
分类号 G01N23/223;G21K1/06;G21K5/02;(IPC1-7):G21K1/06 主分类号 G01N23/223
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