发明名称 CERAMIC HEATER FOR SEMICONDUCTOR WAFER AND MANUFACTURING METHOD THEREOF
摘要 The heater of the present invention comprises: a metal heater made from STS, nickel, inconel, aluminum, titanium, and tungsten; and a coating layer formed on the surface of the heater, which is made from mixed metal materials, to be made from one material among AIN, Al2O3, Y2O3, SIC, nitride, and boron nitride to prevent reaction with corrosive gas including fluorine (F) gas such as NF3 and CIF3. According to the present invention, a semiconductor manufacturing process can be conducted while fundamentally preventing AlF, which is a cause for contamination of the heater, from being generated, thereby improving semiconductor manufacturing efficiency while preventing a change in heater characteristics.
申请公布号 KR20160070916(A) 申请公布日期 2016.06.21
申请号 KR20140177732 申请日期 2014.12.10
申请人 CM KOREA CO., LTD. 发明人 KANG, SEUNG DONG;CHOI, WON CHEL
分类号 H01L21/324;H01L21/02 主分类号 H01L21/324
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