发明名称 |
LACTONE COPOLYMER RESIN AND RADIATION-SENSITIVE RESIN COMPOSITION |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lactone copolymer resin having high transparency to a radiation and suitable for use as the resin component of a chemically amplified resist capable of solving the problem of trade-off of resolution and exposure latitude and excellent also in dry etching resistance and pattern shape and to provide a radiation-sensitive resin composition comprising the lactone copolymer resin. <P>SOLUTION: The lactone copolymer resin comprises a resin which has a repeating unit represented by formula (1) and at least one selected from a repeating unit represented by formula (2-1) and a repeating unit represented by formula (2-2) and becomes alkali-soluble under the action of an acid. The radiation-sensitive resin composition comprises the lactone copolymer resin and a radiation-sensitive acid generator. In the formulae, R<SP>1</SP>-R<SP>3</SP>are each H or methyl. <P>COPYRIGHT: (C)2003,JPO |
申请公布号 |
JP2003255538(A) |
申请公布日期 |
2003.09.10 |
申请号 |
JP20020056401 |
申请日期 |
2002.03.01 |
申请人 |
JSR CORP |
发明人 |
MIYAMATSU TAKASHI;ISHII HIROYUKI;NISHIMURA YUKIO;ISHIDA EIKO |
分类号 |
G03F7/039;C08F220/18;C08F220/26;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|