发明名称 SUBSTRATE FOR ELECTROOPTICAL DEVICE, ITS MANUFACTURING METHOD, ELECTROOPTICAL PANEL AND ELECTRONIC EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a reflecting electrode with higher reflectivity in an electrooptical device such as a liquid crystal device by using laminated structure of alloy of aluminum and APC, etc., and ITO. <P>SOLUTION: An overcoat film 35 is partially arranged on a reflex conductive film, a metal oxide film 19 such as the ITO is arranged in an area where no overcoat film is arranged and the higher reflectivity can be realized by utilizing characteristics of the reflex conductive film with high reflectivity in comparison with a case that an ITO film is formed on the reflex conductive film. In addition, conduction between the reflex conductive film and the metal oxide film is secured and a substrate having the reflecting electrode with high reflectivity is realized since the metal oxide film such as the ITO in the area where no overcoat film is arranged on the reflex conductive film is arranged. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003255335(A) 申请公布日期 2003.09.10
申请号 JP20020060721 申请日期 2002.03.06
申请人 SEIKO EPSON CORP 发明人 UEHARA TOSHINORI;ODAGIRI YORIHIRO
分类号 G02F1/1335;G02F1/1343 主分类号 G02F1/1335
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